JournalTOCs

About Help News

IEEE Nanotechnology Express
Number of Followers: 18

Hybrid journal (It can contain Open Access articles)
ISSN (Online) 2332-7715
Published by IEEE

[228 journals]

Monolithic Fabrication of Silicon Nanowires Bridging Thick Silicon
Structures
- Free pre-print version: Loading...
  Rate this result: What is this?
  
  Please help us test our new pre-print finding feature by giving the pre-print link a rating.
  A 5 star rating indicates the linked pre-print has the exact same content as the published article.
  
  Authors: Zuhal Tasdemir;Oliver Peric;Davide Sacchetto;Georg Ernest Fantner;Yusuf Leblebici;B. Erdem Alaca;
  Pages: 2 - 5
  Abstract: A monolithic process is developed for the fabrication of Si nanowires within thick Si substrates. A combination of anisotropic etch and sidewall passivation is utilized to protect and release Si lines during the subsequent deep etch. An etch depth of $10~\mu \text{m}$ is demonstrated with a future prospect for 50 $\mu \text{m}$ opening up new possibilities for the deterministic integration of nanowires with microsystems. Nanowires with in-plane dimensions as low as 20 nm and aspect ratios up to 150 are obtained. Nanomechanical characterization through bending tests further confirms structural integrity of the connection between nanowires and anchoring Si microstructures.
  PubDate: 2015
  Issue No: Vol. 1 (2015)

JournalTOCs
School of Mathematical and Computer Sciences
Heriot-Watt University
Edinburgh, EH14 4AS, UK
Email: journaltocs@hw.ac.uk
Tel: +00 44 (0)131 4513762

Your IP address: 3.235.25.27

Home (Search)
API
About JournalTOCs
News (blog, publications)